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MICROSCOPY AND ANALYSIS NOVEMBER 201135WHAT'SNEWCIRCLENO. 32 ORONLINE: www.microscopy-analysis.comLift-Out Shuttle for TEMJPK Instruments hasexpanded its family ofhigh performanceresearch AFM systemswith the announcementof the availability of theNanoWizard 3 Nano-Optics AFM system.Over the past decade,optical phenomena onthe nanoscale havedeveloped into an excit-ing area of research. Tostudy light on the nanoscale and especially its interaction with matter, researcherslook for methods with nanometer spatial resolution. The combination of lightmicroscopy-derived techniques and scanning probe microscopy is a powerful solu-tion. This so-called near-field optical microscopy delivers optical information fromsample surfaces with sub-wavelength resolution.JPK strongly believes in combining techniques, in particular AFM, with optics.This has opened up a field of new applications including TERS/SERS, tip-enhancedfluorescence, nanomanipulation with light, chemical surface analysis and com-pound detection, metamaterials, developments of optically active componentssuch as dyes, markers, light sources and switches. A large number of user publica-tions underscore the success of this technology approach. Now, JPK introducestheir latest platform for AFM and optics - the NanoWizard3 NanoOptics system.The NanoWizard NanoOptics head comes with excellent physical and opticalaccess to the sample from top and bottom as well as from front and side, evenwhen the head and condenser are in place. Additionally, it has an integrated portfor fiber SNOM applications.The new system is ready for a broad range of applications from nanoscale opti-cal imaging by aperture and scattering-type SNOM to experiments involving inter-actions of light with the sample such as absorption, excitation, nonlinear effectsand quenching; these include aperture fiber SNOM experiments using an inte-grated fiber SNOM port in the NanoOptics head and the tuning fork module. Contact: JPK Instruments AG www.jpk.comNano Optics on AFMWorking with leadingGerman manufacturerof precision manipula-tion products, KleindiekNanotechnik, Agar Sci-entific are pleased tooffer the Lift-Out Shut-tle for the UK and Irishmarkets.In-situ lift-out tech-niques have becomemore reliable methodsfor preparation of samples requiring TEM and atom probe inspection. However,despite their new-found popularity, they remain considerably more expensive thanex-situ lift-out techniques and require lots of valuable time in the focused ionbeam (FIB). Time and cost factors call for a faster, simpler procedure while furtherimproving the reliability of the technique. By combining a precision sub-stage with a microgripper system and their novelSemGlu, Kleindiek have developed a new, fast, easy and efficient tool: The Lift-OutShuttle. This device is small enough to fit through the load lock of most commonelectron microscopes. Mounting the sample and the TEM-grid that has beentreated with a small amount of SemGlu to a single microscope stub puts all thepieces necessary for lift-out in place. The stub is then attached to the four-axis(XYZR) sub-stage. Additionally, the Microgripper is fixed to same mounting plateon which the sub-stage is positioned. In this configuration, the gripper remains sta-tionary above the sub-stage and therefore is always centred in the field-of-view ofthe microscope. The stub containing the sample and grid is positioned under thegripper using the sub-stage.With a minimal amount of practice, a sample can be fixed to a grid in five min-utes or less by gripping the previously cut sample, lifting out of the substrate, mov-ing the stage to the TEM-grid (which has been pre-treated with SEMGLU by simplyapplying some glue to the grid using a needle), and mounting the sample to thegrid by making contact between the two and focussing the e-beam on the contactpoint.Contact: Agar Scientific Limited www.agarscientific.comCIRCLENO. 33 ORONLINE: www.microscopy-analysis.comSURFACECOMPOSITIONANALYSISFORIONMICROSCOPYHiden's EQS and MAXIM SIMS analysers provide:chemical surface compositionanalysis for ion probemicroscopydepth profiling andsurface imaging atthe nano scaleinterface toexisting systemsfor further details of Hiden Analytical products for advanced scienceEQS bolt-on SIMS probe Page 1????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????????

MICROSCOPY AND ANALYSIS 36NOVEMBER 2011Boeckeler RMC Productsrecently celebrated thesuccessful launch of itsnew environmentalchamber for ultramicro-tomy during a trainingdemonstration at theSociété Française Mu(SFmu) 2011 conferenceheld in Strasbourg,France last June. Accord-ing to Boeckeler President Pat Brey, the demonstration included an impressivearray of sectioning methods including sectioning for low voltage TEM (transmissionelectron microscopy), Tokuyasu immunolabeling and CEMOVIS (cryo-electronmicroscopy of vitreous sections) sectioning. The environmental chamber was critical to creating the parameters necessary forproducing a continuous ribbon of 25 sections of a frozen hydrated sample 50 nmthick that had been flash frozen under high pressure. Such high-pressure freezingof biological specimens retains as much cell structure as possible for viewing underan electron microscope. The CEMOVIS method of sample preparation is experi-encing resurgence in popularity among cell biologists since it was introduced in the1980s, due in part to advances in overcoming some of the difficulties first encoun-tered in the method. "These tiny ribbons are so thin, they could be free-floating," Mr Brey says. "So,that means that the environment around the RMC ultramicrotome had to be espe-cially free of air movement and static charges, which the chamber and ionizer suc-cessfully provided." The work was performed on samples frozen in the lab of Daniele Spehner fromthe Institute of Genetics and Molecular and Cellular Biology. Colleague CarolineKizilyaprak from Bruno Humbel's lab at the University of Lausanne, and GregBecker of RMC performed the sample trimming and sectioning, using a Diatome35-degree diamond knife. Contact: Boeckeler Instruments Inc. Environmental Cryo ChamberCEMOVIS 50 nm serial sections of yeast cut on an RMC PT-PC systemThe new phoenix x|aminer from GE's Inspection Technologies business is a 5-axis,microfocus X-ray inspection system, which has been developed for quality controlapplications in the manufacture of electronics sub-assemblies. It is particularly suit-able for the reliable and accurate inspection of soldered joints. The phoenixx|aminer features two megapixel high resolution and high magnification. In addi-tion, its powerful imaging software permits intuitive programming and compo-nent manipulation is precise and easy using a computer mouse or joystick. An important design feature of the new system is its OVHM (oblique view highmagnification) module, which allows an oblique angle view of up to 70° as well asa total magnification of up to >23,000??. This ensures best possible quality of defectinformation in the vertical direction. Ease of maintenance is also permitted with thesystem's open, 160 kV microfocus tube design, whose easy cathode replacementensures unlimited operating life, while its 20 W of tube power at target can pene-trate even the most radiation-absorbing components. The new x|aminer is suppliedwith the recently launched phoenix x|act software, which is designed specially forelectronics inspection. Contact: GE Energy Services X-Ray Inspection SolutionBackscatter DiffractionOxford Instruments NanoAnalysis, a world leader in microanalysis systems,launched a new EBSD detector at M&M 2011 in Nashville. The new NordlysNanoaddresses the growing requirements of nanoscale applications: it is 60% more sen-sitive than the previous generation of EBSD detector, the NordlysS. Increased sensitivity offers a number of benefits. Firstly, accurate EBSD data canbe collected at lower beam energy, including low beam currents (<0.1 nA) and lowkV. Using lower energy beams is essential for applications where spatial resolutionis required, for example nanoscale applications. It is also important when lookingat beam sensitive samples, or non-conducting samples. In addition, increased sen-sitivity enables faster data acquisition under comparable beam conditions. According to EBSD Business Manager, Dr Jenny Goulden, "As a business, OxfordInstruments aims to use innovation to turn smart science into world class productsthat delight our customers, and the NordlysNano is a classic example of achievingjust that!" The new NordlysNano EBSD detector is 60% more sensitive than its pre-decessor, the NordlysS. It enables faster and higher resolution analysis of a crystal structure.Contact: Oxford Instruments www.oxford-instruments.comHitachi High-Technologies has launched the IM4000 Ion Milling system. Used toprepare specimens for scanning electron microscope (SEM) imaging and analyticalstudies such as EDX and EBSP, the versatile IM4000 is capable of both pin-pointcross-section and flat surface ion milling. Cross-section milling provides smooth cross-section specimens for high resolutionimaging of subsurface structures, with the cross-section position accurately con-trollable by fine positioning of a beam-shielding mask edge. Flat milling providesuniform polishing of surfaces of 5 mm in diameter or more with variable anglemilling, to either flatten surfaces or to selectively enhance specimen surface fea-tures (relief milling). The two IM4000 applications -cross-section and flat surfacemilling -are realised via two different removable sample stage units, allowing forconvenient specimen setting and cutting edge definition using an external opticalmicroscope.The IM4000 ion milling system features a new high-current argon ion gun thatdelivers cross-sectional milling rates of 300 um/hr in silicon for dramatically reducedcross-sectioning times. The wide Argon ion beam can define sharp cross sectionseven on samples of dissimilar materials with different hardness that can not be cutor broken without causing material deformations or dislocations. Sensitive mate-rials like polymers or papers can be processed by freely selecting proper lower ionbeam energies between 0 and 6 kV, without need for special sample cooling. Wide and smooth flat milled surfaces of approximately 5mm in diameter ormore can be achieved within minutes by shifting the centre of the defocused ionbeam from the sample rotation or swinging centre. The beam irradiation angle tothe specimen surface is selectable from 0 to 90 degrees. Contact: Hitachi High-Technologies Corporation www.hht-eu.comArgon Ion Milling System